International Business Times

Fujifilm triples Oita post-CMP cleaner capacity for AI chips

The new Oita building began operating in August, lifting post-CMP cleaner capacity threefold as Fujifilm expands ...
RBB Today

化学機械研磨装置(CMP)市場調査分析レポート：トップ5企業の生産 ...

化学機械研磨装置（CMP）は、半導体製造工程においてウェーハ表面を化学反応と機械研磨の相乗効果によりナノレベルで平坦化する装置であり、特に多層配線構造や先端ロジック・メモリデバイスの形成に不可欠なプロセス装置です。スラリー中の化学薬剤 ...

Fujifilm Completes New Production Facility for Advanced Semiconductor Materials in Oita, Japan

Significantly Expanding Production Capacity for Post-CMP Cleaners*1 to Meet Growing Demand for AI SemiconductorsAugust 21, ...

Entegris Achieves Further Success in Defending Its CMP Slurry Patent Portfolio

Entegris, Inc. (Nasdaq: ENTG), a leading supplier of critical advanced materials and process solutions for the semiconductor ...
The Chosun Ilbo on MSN

Semiconductor boom fuels profit surge for South Korean material firms

Improvements in the semiconductor industry and expanded investments in artificial intelligence (AI) and high-bandwidth memory ...